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Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H₂-Ar low-pressure plasmas

机译：H _{2 -ar低压等离子体中不同电极覆盖材料的原子氢表面损失概率}

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Sode, M.; Schwarz-Selinger, T.; Jacob, W.; Kersten, H.;
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年度 2014
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正文语种 eng
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1. Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H2-Ar low-pressure plasmas [J] . Sode M., Schwarz-Selinger T., Jacob W., Journal of Applied Physics . 2014,第1期

机译：在H2-Ar低压等离子体中研究不同电极覆盖材料的原子氢表面损失概率
2. Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H_2-Ar low-pressure plasmas [J] . M. Sode, T. Schwarz-Selinger, W. Jacob, Journal of Applied Physics . 2014,第1期

机译：在H_2-Ar低压等离子体中研究不同电极覆盖材料的原子氢表面损失概率
3. Feasibility of atomic layer etching of polymer material based on sequential O_2 exposure and Ar low-pressure plasma-etching [J] . Evelina Vogli, Dominik Metzler, Gottlieb S. Oehrlein Applied Physics Letters . 2013,第25期

机译：基于顺序的O_2暴露和Ar低压等离子体刻蚀对聚合物材料进行原子层刻蚀的可行性
4. Investigation of surface modifications of 193 nm and 248 nm photoresist materials during low-pressure plasma etching [C] . Ling, L., Hua, . 2004

机译：低压等离子体刻蚀过程中193 nm和248 nm光刻胶材料的表面改性研究
5. Inductively coupled hydrogen plasma-assisted copper atomic layer deposition on metallic and dielectric surfaces. [D] . Jezewski, Christopher John. 2005

机译：金属和电介质表面上的电感耦合氢等离子体辅助铜原子层沉积。
6. Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the Silver Electrode [O] . Walter Giurlani, Andrea Giaccherini, Nicola Calisi, 2018

机译：银电极上Bi2Se3电化学原子层生长和铋的表面受限沉积研究
7. Study of the materials on plasma electrode surface for negative ion extraction in hydrogen and deuterium operation [O] . S. Masaki, K. Maeshiro, K. Tsumori, 2018

机译：氢气和氘运转负离子萃取等离子体电极表面材料的研究
8. Dynamics of Chemisorption/Scattering of Atomic Hydrogen on Partially Covered Si(111) Surfaces [R] . Rice, B. M., Raff, L. M., Thompson, D. L. 1988

机译：部分包覆si（111）表面原子氢的化学吸附/散射动力学

Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H2-Ar low-pressure plasmas

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Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H₂-Ar low-pressure plasmas